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Workshop I：Extreme Ultraviolet Technology and Applications Workshop
Chairs: Pin-Jiun Wu (吳品鈞)/ Bor-Yuan Shew (許博淵)/ Mau-Tsu Tang (湯茂竹)
| September 4 (Thursday) | Place: M222/M223 |
08:30 | | Registration -@Activity Center (Entrance 5) |
09:00 | | SIKA十週年 --- ACNS and NSRRC Remote Celebration Place: D260 |
10:30 | | Opening Remarks Chia-Hung Hsu (徐嘉鴻), NSRRC (國家同步輻射研究中心) |
| | Session Chair: Bor-Yuan Shew (許博淵) |
10:40 | I1 | Lensless EUV Lithography and Metrology at Swiss Light Source Yasin Ekinci, Paul Scherrer Institute (PSI), Switzerland |
11:10 | I2 | History, Current Status, and Prospect for EUVL Takeo Watanabe (渡邊 健夫), Univ. of Hyogo, Japan |
11:40 | I3 | Enhanced Edge Etching Resistance and EUV-lithographic Performance of a Tin-oxide Photoresist Via a Blend Strategy Rai-Shung Liu (劉瑞雄), National Tsing Hua Univ. (國立清華大學) |
12:10 | | Lunch |
| | Session Chair: Mau-Tsu Tang (湯茂竹) |
13:30 | I4 | Advancements in Turnkey Attosecond Sources for Extreme Ultraviolet Metrology Ming-Chang Chen (陳明彰), National Tsing Hua Univ. (國立清華大學) |
14:00 | I5 | Study the Optical properties of Structured Materials for Vital Issues in Extreme ultraviolet (EUV) Lithography Hsuen-Li Chen (陳學禮), National Taiwan Univ. (國立臺灣大學) |
14:30 | I6 | Detectors Array for On-Wafer EUV Imaging in Advanced Lithography Systems Ya-Chin King (金雅琴), National Tsing Hua Univ. (國立清華大學) |
15:00 | | Coffee Break |
| | Session Chair: Pin-Jiun Wu (吳品鈞) |
15:20 | I7 | Applications of Atomic Layer Deposition in Extreme Ultraviolet Lithography Wen-Hao Cho (卓文浩), National Center for Instrumentation Research (國家儀器科技研究中心) |
15:50 | I8 | Spectral Responsivity Calibration for EUV Dose Evaluation Yi-Chen Chuang (莊宜蓁), Industrial Technology Research Institute (工業技術研究院) |
16:20 | | Discussion & Closing Remarks |
Except for international speakers, all presentations by domestic speakers will primarily be delivered in Chinese, with English used as a supplement.